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J. Chapelle

GREMI, Universite d'Orleans, 14 rue d'Issoudun, B.P 6744, 45067 ORLEANS, FRANCE

Articles:

OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H₂ RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA - Vol. 7 '2003 - High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

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of Specialists in Thermal & Fluids Engineering

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