The home for science and engineering™
English
中文
Русский
日本語
Português
Deutsch
Français
Español
Prices and Subscription Policies
About Begell House
Contact Us
Customer Login
0
Shopping Cart
Search box
Search
Home
Books
eBooks
Journals
References and Proceedings
Authors, Editors, Reviewers
A-Z Product Index
Find Journals
Home
Begell House Authors, Editors and Reviewers
Begell House Authors, Editors and Reviewers
Menu
For Authors
For Editors
For Reviewers
Dimitrious E. Rapakoulias
Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece
Get more info about author from Directory of Specialists
Articles
IMPROVEMENTS IN CONTROL AND UNDERSTANDING OF RADIO FREQUENCY SILANE DISCHARGES
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE
Vol. 11 '2007
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 15 '2011
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES
Vol. 3 '1999
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 4 '2000
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O
2
GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO
2
THIN FILMS
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PLASMA PARAMETERS DERIVED FROM ELECTRICAL MEASUREMENTS IN RF PARALLEL PLATE ARGON GLOW DISCHARGES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
SPECIFIC PROBLEMS OF ROTATIONAL TEMPERATURE DETERMINATION IN PLASMAS OF MOLECULAR GASES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
Home
Begell Digital Portal
Begell Digital Library
Journals
Books
eBooks
References and Proceedings
Authors, Editors, Reviewers
A-Z Product Index
Find Journals
Prices and Subscription Policies
About Begell House
Contact Us
Language
English
中文
Русский
日本語
Português
Deutsch
Français
Español