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Dimitrious E. Rapakoulias

Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece

Editorial Boards:

High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

Articles:

INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE - Vol. 11 '2007 - High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH₄/H₂ DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES - Vol. 4 '2000 - High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

TEOS/O₂ GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO₂ THIN FILMS - Vol. 9 '2005 - High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

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