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A. Panou

Plasma Technology Lab, Dept.Chem. Engineering, University of Pates, P.O.Box 1407,26500 Patra, Greece

Articles:

TEOS/O₂ GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO₂ THIN FILMS - Vol. 9 '2005 - High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

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