Begell House作者，编辑及审稿者

P. Gkotsis

Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece
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Articles

INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE Vol. 11 '2007 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes