Begell House作者，编辑及审稿者

A. Panou

Plasma Technology Lab, Dept.Chem. Engineering, University of Pates, P.O.Box 1407,26500 Patra, Greece
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Articles

TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes