The home for science and engineering™
Deutsch
English
中文
Русский
日本語
Português
Français
Español
Preise und Aborichtlinien
Über Begell House
Kontakt
Kundenlogin
0
Einkaufswagen
Search box
Search
Home
Bücher
eBücher
Zeitschriften
Referenzen und Berichte
Autoren, Herausgeber, Rezensenten
A – Z Produktindex
Journale finden
Home
Autoren, Herausgeber und Rezensenten von Begell House
Autoren, Herausgeber und Rezensenten von Begell House
Menu
Informationen für Autoren
Informationen für Herausgeber
Für Rezensenten
C. Trassy
UPR 9033 CNRS - EPM, ENSHMG BP 95 - 38402 Saint-Martin-d'Heres - France
Weitere Infos über den Autor erhalten Sie im Expertenverzeichnis
Articles
COMPARISON OF AIR AND ARGON PLASMAS IN GASEOUS ELEMENTAL POLLUTANT ANALYSIS FOR PROCESS CONTROL AND ENVIRONMENT
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTINUOUS MONITORING OF METAL VOLATILISATION IN A PLASMA FURNACE BY INDUCTIVELY COUPLED PLASMA EMISSION SPECTROMETRY
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTROL OF THE EVAPORATION IN A PLASMA FURNACE FOR FERROSILICON DUST TREATMENT
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EXPERIMENTAL STUDY OF THE EFFECT OF REACTIVE GAS INJECTION GEOMETRY IN ATMOSPHERIC PRESSURE INDUCTIVE PLASMA TORCH ON THE CHEMICAL EFFICIENCY
Vol. 13 '2009
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
NUMERICAL STUDY OF THE REACTIVE SPECIES
Vol. 14 '2010
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: ROLE OF CALIBRATION AND SAMPLE GAS
Vol. 5 '2001
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
MICROWAVE PECVD SYSTEM FOR SiN
x
:H ANTIREFLECTION COATINGS AND HYDROGEN PASSIVATION ON MULTICRYSTALLINE SILICON
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EXPERIMENTAL INVESTIGATION OF METAL PARTICLE VAPORIZATION IN PLASMA SPRAYING
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
MACROSCOPIC TECHNIQUES FOR RF. PLASMA REACTOR DIAGNOSTICS
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
ON LINE MONITORING OF ELEMENTAL POLLUTANTS IN FLUE GASES: STANDARDIZATION, PRECISION AND ACCURACY
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
SIMULATION OF THE d
3
Πg-a
3
Πu SYSTEM (SWAN BAND) OF THE C
2
MOLECULE IN ATMOSPHERIC PRESSURE ARGON ICP FOR DIAGNOSTIC OF DIAMOND DEPOSITION PROCESS
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
TRUENESS AND PRECISION IN ON-LINE MONITORING OF METALLIC POLLUTANTS IN FLUE GASES BY ICP-OES
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
CONTROL OF INDUCTIVELY COUPLED PLASMA PROCESSES BY MODELLING OF THE OPTICAL SPECTROSCOPIC EMISSION
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
GAS TEMPERATURE IN CONTRACTED ATMOSPHERIC PRESSURE DISCHARGES SUSTAINED IN CYLINDRICAL TUBES BY MICROWAVES AT 2450 MHZ
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
ON-LINE CONTINUOUS MONITORING OF A PLASMA PURIFICATION PROCESS USING ANALYSIS OF METALS IN FLUE GASES BY ICP-OES
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
VALIDATION OF EXPERIMENTAL INVESTIGATION OF METAL PARTICLE VAPORISATION IN PLASMA SPRAYING BY ATOMIC SPECTROSCOPY: DETERMINATION OF DIFFUSION COEFFICIENTS
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
EFFECT OF ELECTRIC FIELD ON THE NON-EQUILIBRIUM IN AN INDUCTIVELY COUPLED PLASMA
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
MICROWAVE PECVD SYSTEM FOR SiN
x
:H ANTIREFLECTION COATINGS AND HYDROGEN PASSIVATION ON MULTICRYSTALLINE SILICON
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
PLASMA REFINING OF METALLURGICAL SILICON: THERMODYNAMIC AND CHEMICAL ASPECTS
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
Home
Digitales Begell-Portal
Begell Digitale Bibliothek
Zeitschriften
Bücher
eBücher
Referenzen und Berichte
Autoren, Herausgeber, Rezensenten
A – Z Produktindex
Journale finden
Preise und Aborichtlinien
Über Begell House
Kontakt
Language
English
中文
Русский
日本語
Português
Deutsch
Français
Español