Autoren, Herausgeber und Rezensenten von Begell House

S. Darwiche

Laboratoire de Genie des Procedes Plasmas et Traitement de Surface - Université Pierre et Mane Curie- ENSCP 11-13, rue Pierre et Marie Curie 75231 Paris Cedex 05 France
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Articles

EFFECTS OF PLASMA PARAMETERS ON PASSIVATION OF POLYCRYSTALLINE SILICON IN INDUCTIVE LOW PRESSURE HYDROGEN PLASMA Vol. 11 '2007 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H2 RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
HYDROGENATION AND PURIFICATION OF SILICON BY RF PLASMA Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL DIAGNOSTICS TO CONTROL ON LINE MELTING OF SILICON MATERIAL TREATED BY THERMAL PLASMA PROCESS. NEW IMPROVEMENTS FACED WITH SEVERE CONDITIONS. Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PASSIVATION OF POLYCRYSTALLINE SILICON BY HYDROGEN PLASMA : CHARACTERIZATION BY IMPEDANCE SPECTROSCOPY Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003