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Progress in Plasma Processing of Materials, 2001

ISBN:
1-56700-165-3 (Print)

VACUUM ARC DEPOSITED NANOSTRUCTURED Ti COATINGS

B. B. Straumal
I. V. T. Ltd. (Institute for Vacuum Technology) - P.O. Box 47- 109180 Moscow - Russia; Institut fur Metallkunde - Seestr. 92 - 70174 Stuttgart - Germany

N .F. Vershinin
I. V. T. Ltd. (Institute for Vacuum Technology) - P.O. Box 47- 109180 Moscow - Russia

E. Rabkin
Dpt Materials Engineering - TECHNION-Israel Institute of Technology - 32000 Haifa - Israel

R. Kroeger
Dpt Materials Engineering - TECHNION-Israel Institute of Technology - 32000 Haifa - Israel

R. Dimitriou
PECHINEY CRV - BP 27 - 38340 Voreppe - France

W. Gust
Institut fur Metallkunde - Seestr. 92 - 70174 Stuttgart - Germany

Abstract

Ti coatings on silicate glass substrates have been produced using a nonfiltered vacuum arc deposition technique. The dependence of the deposition rate on the distance from the cathode both in lateral and transversal directions was investigated. The average roughness, Ra, decreases with the distance, showing a transition area between the microparticle-containing and microparticle-free Ti films. A linear dependence of Ra on the discharge current was obtained only for substrates far enough from the cathode. For substrates close to the cathode the dependence is governed by the microparticle density. Transmission electron microscopy (???) reveals dense structure with nanograins.