Home Books eBooks Journals References & Proceedings Authors, Editors, Reviewers A-Z Product Index Awards
Progress in Plasma Processing of Materials, 2001

ISBN:
1-56700-165-3 (Print)

DEPOSITION OF YTTRIA-STABILISED ZIRCONIA COATINGS USING LIQUID PRECURSORS

E. Bouyer
German Aerospace Center (DLR), Pfaffenwaldring 38-40, 70569 Stuttgart, Germany

David W. Branston
Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany

Gunter Lins
Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany

Matthias Muller
DLR, Institute of Technical Thermodynamics, Vaihingen, Pfaffenwaldring 38-40, D-70569 Stuttgart, Germany

J. Verleger
Siemens Corporate Technology, ZT EN 3, Postfach 3220, 91050 Erlangen, Germany

M. von Bradke
German Aerospace Center (DLR), Pfaffenwaldring 38-40, 70569 Stuttgart, Germany

Abstract

Aqueous solutions containing ZrO(NO3)2·6H2O were injected into an inductively generated high-power plasma to produce zirconia coatings in a thermal plasma chemical vapour deposition (TPCVD) process. Coatings of monoclinic ZrO2 which adhered well to the substrate were obtained when ZrO(NO3)2·6H2O alone was present in the solvent with a concentration of 0.7 mol/1. When Y(NO3)3·6H2O was added such that the concentration ratio of Zr and Y salts was 6:1, the ZrO2 forming the coatings was stabilised in its cubic modification which was confirmed by X-ray diffractometry as well as EDX mapping.