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Progress in Plasma Processing of Materials, 2001

ISBN:
1-56700-165-3 (Print)

ION CLEANING AND NITRIDING USING A HIGH APERTURE HALL CURRENT ACCELERATOR

B. B. Straumal
I. V. T. Ltd. (Institute for Vacuum Technology) - P.O. Box 47- 109180 Moscow - Russia; Institut fur Metallkunde - Seestr. 92 - 70174 Stuttgart - Germany

N .F. Vershinin
I. V. T. Ltd. (Institute for Vacuum Technology) - P.O. Box 47- 109180 Moscow - Russia

S. A. Polyakov
Institut fur Metallkunde - Seestr. 92 - 70174 Stuttgart - Germany; Institute of Solid State Physics - Chernogolovka - Moscow District - 142432 Russia

P. V. Orlova
Institute of Solid State Physics - Chernogolovka - Moscow District - 142432 Russia

M. Friesel
SIMS Laboratory - Chalmers University of Technology - 41296 Gothenburg - Sweden

W. Gust
Institut fur Metallkunde - Seestr. 92 - 70174 Stuttgart - Germany

Abstract

A large aperture Hall current accelerator has been developed for ion cleaning of substrates before vacuum arc deposition of protective and decorative layers. The accelerator has a large aperture of 1400 mm and a power up to 10 kW. High ion currents permit one to use the source also for ion implantation. Various gases can be used for both purposes: argon, nitrogen, oxygen, etc. The current-voltage characteristics for nitrogen at various pressures are presented. The ion implantation of nitrogen was performed into austenitic stainless steel at a discharge voltage of 900 V and a discharge current of 3 A. The depth profiles were measured with the aid of secondary-ion mass spectroscopy. The load dependence of the microhardness after ion nitriding was measured.