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Progress in Plasma Processing of Materials, 2001

ISBN:
1-56700-165-3 (Print)

ON-LINE CONTINUOUS MONITORING OF A PLASMA PURIFICATION PROCESS USING ANALYSIS OF METALS IN FLUE GASES BY ICP-OES

C. Alemany
EPM Laboratory, ENSHMG, BP 95, F-38402 Saint Martin d'Heres, France

C. Trassy
UPR 9033 CNRS - EPM, ENSHMG BP 95 - 38402 Saint-Martin-d'Heres - France

Abstract

An on-line technique initially developed to monitor metallic pollutants in the flue gases of incineration plants has been adapted to be used in a metal purification process combining an inductive cold crucible with a RF plasma torch. The reactor for purification was designed to simplify the transposition of the process. The out gases from the reactor are continuously sampled and injected into a commercial ICP-based analytical system. The interface between the process and the control unit for the ICP torch involves a stabilised pressure environment and a calibrated tube. With this system the elements in the out gases, concentrations ranging from 1 μg.m−3 to 0.1 g.m−3, can be continuously monitored. This diagnostic technique has been used to study the operating conditions for the purification process.