Home Books eBooks Journals References & Proceedings Authors, Editors, Reviewers A-Z Product Index Awards
Progress in Plasma Processing of Materials, 1997

ISBN:
1-56700-093-2 (Print)

RECOMBINATION AND DIFFUSION IN AN INDUCTIVELY COUPLED ARGON PLASMA DURING POWER INTERRUPTION

Joost J. A. M. van der Mullen
Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands

J. M. de Regt
Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

J. Jonkers
Department ofPhysics, Eindhoven University ofTechnology P.O. Box 513,5600 MB Eindhoven, The Netherlands

F. P. J. de Groote
Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

Abstract

The temporal behavior of the electron density ne and temperature Te during the power interruption of an inductively coupled plasma (ICP) is measured. The simulation of ne as a function of time using a one-dimensional model including ambipolar diffusion and three particle recombination fits the measurements in the inner part (50% of the radius) of the plasma. However, for the measured fast ne−decay observed at the outer part of the plasma other processes must be reponsible.