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Progress in Plasma Processing of Materials, 1999

ISBN:
1-56700-126-2 (Print)

IN-FLIGHT MEASUREMENT OF PARTICLE SIZE AND VELOCITY IN A RADIO FREQUENCY PLASMA TORCH

E. Francke
Laboratoire de Génie Procédés Plasmas et Traitement de Surface, Université Pierre et Mane Curie- ENSCP 11-13, rue Pierre et Marie Curie 75231 Paris Cedex 05 France

F. Krayem
ENSCP-UPMC Laboratory of plasma processing and surface treatment 11, rue Pierre et Marie Curie 75005 Paris - France

Daniel Morvan
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

Sergey V. Dresvin
Laboratory of Electrotechnological and Plasma Installation of Polytechnic Institute -SPb State Polytechnical University, 29 Polytechnicheskaya Str., 195251 Saint-Petersburg, Russia

S. Nguyen-Kuok
Laboratory of Electrotechnological and Plasma Installation Polytechnical Institute- University of St Petersburg, Russia

Abstract

To investigate purification process of silicon by heating, melting and evaporation dynamics, Laser Doppler Anemmometry (LDA) and Laser Doppler Granulometry (LDG) have been used, deep inside R.F. plasma torch, despite temperature and extreme physical conditions in this medium. The process observed in flight were characterized through : particle rate, particle velocity, as well as particles size. When silicon particles get through the torch, they undergo rapid heating and melt into droplets, part of the liquid mass is evaporated proportionally to the surface of molten particles while the impurities concentrated on the surface are eliminated by evaporation.