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Progress in Plasma Processing of Materials, 2003

ISBN:
978-1-56700-192-1 (Print)
978-1-56700-447-2 (Online)

ROTATIONAL TEMPERATURE AS A TOOL FOR DIAGNOSTICS OF HF PLASMA CHANNEL BURNING AT ATMOSPHERIC PRESSURE

P. Slavicek
Department of Physical Electronics, Masaryk University Kotlarska 2, 611 37 Brno, Czech Republic

Antonin Brablec
Dep. of Physical Electronics, Masaryk University Kotlarska 2, 611 37 Brno, Czech Republic

V. Kapicka
Dep. of Physical Electronics, Masaryk University Kotlarska 2, 611 37 Brno, Czech Republic

M. Klima
Department of Physical Electronics, Masaryk University Kotlarska 2, 611 37 Brno, Czech Republic

J. Kousal
Dep. of Physical Electronics, Masaryk University Kotlarska 2, 611 37 Brno, Czech Republic

Abstract

It is well known that HF discharges can burn as well at atmospheric pressure. Special properties of the HF discharges offer many technological applications like deposition of thin solid films, cleaning and treatment of surfaces5 restoration of archaeological artifacts and others. It was demonstrated that the discharges could be sustained in liquids. Next, they can interact with the bulk material and new chemical compounds can arise. Therefore, the detail knowledge of their physical parameters has been required. The parameters of the plasma channel were investigated by spectral and optical methods. Some typical properties of the discharge have been already reported. In this contribution we present the measurement of spectral lines and bands emitted by HF discharge at atmospheric pressure. We compare rotational temperature estimated from OH rotational bands and from rotational ones of nitrogen at various conditions in the discharge. We used broadening of hydrogen line Hβ to estimate the concentration of electrons.