The home for science and engineering™
Español
English
中文
Русский
日本語
Português
Deutsch
Français
Precios y Políticas de Suscripcione
Sobre Begell House
Contáctenos
Ingreso de Usuario
0
Carrito de Compras
Search box
Search
Inicio
Libros
eLibros
Revistas
Referencias y Libros de Ponencias
Autores, Editores, Críticos
Índice de Productos de la A a la Z
Encontrar revistas
Inicio
Autores, Editores y Críticos de Begell House
Autores, Editores y Críticos de Begell House
Menu
Para autores
Para editores
Para revisores
Dimitrious E. Rapakoulias
Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece
Obtenga más información sobre el autor en el Directorio de Especialistas
Articles
IMPROVEMENTS IN CONTROL AND UNDERSTANDING OF RADIO FREQUENCY SILANE DISCHARGES
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE
Vol. 11 '2007
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 15 '2011
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES
Vol. 3 '1999
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 4 '2000
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O
2
GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO
2
THIN FILMS
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PLASMA PARAMETERS DERIVED FROM ELECTRICAL MEASUREMENTS IN RF PARALLEL PLATE ARGON GLOW DISCHARGES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
SPECIFIC PROBLEMS OF ROTATIONAL TEMPERATURE DETERMINATION IN PLASMAS OF MOLECULAR GASES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
Inicio
Portal Digital Begell
Biblioteca Digital Begell
Revistas
Libros
eLibros
Referencias y Libros de Ponencias
Autores, Editores, Críticos
Índice de Productos de la A a la Z
Encontrar revistas
Precios y Políticas de Suscripcione
Sobre Begell House
Contáctenos
Language
English
中文
Русский
日本語
Português
Deutsch
Français
Español