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Daniel Morvan
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France
Obtenga más información sobre el autor en el Directorio de Especialistas
Articles
LIBS ANALYSIS OF PHOTOVOLTAIC MATERIAL INCLUDING WAFER AND RAW MATERIAL
Vol. 10 '2006
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL EMISSION SPECTROSCOPY OF A SUPERSONIC LOW-PRESSURE PLASMA REACTOR USED TO SYNTHESIS SOFC CATHODES THIN LAYERS
Vol. 10 '2006
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
RF PLASMA PROCESS FOR HIGH PURITY SILICON
Vol. 10 '2006
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF PLASMA PARAMETERS ON PASSIVATION OF POLYCRYSTALLINE SILICON IN INDUCTIVE LOW PRESSURE HYDROGEN PLASMA
Vol. 11 '2007
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
A FLEXIBLE LOW PRESSURE PLASMA PROCESS FOR THE DEPOSITION OF COMPLEX THICK OXIDE COATINGS
Vol. 13 '2009
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF THE DC BIAS APPLIED TO A MG MOLTEN SILICON BATH ON ITS PURIFICATION BY RF THERMAL PLASMA
Vol. 13 '2009
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
NON EQUILIBRIUM CALCULATION OF THE INDUCTIVELY COUPLED PLASMA TORCH. EFFECT OF THE AXIAL COLD CHANNEL
Vol. 3 '1999
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Study of excited atomic states of hydrogen and chemical phenomena on liquid silicon target under a RF inductive thermal plasma torch
Vol. 5 '2001
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CALCULATION OF SILICON PARTICLES DYNAMICS, HEAT AND MASS TRANSFERS IN THERMAL PLASMAS. EFFECT OF PARTICLES VAPORIZATION
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF PLASMA PARAMETERS ON THE PROPERTIES OF La
1-x
Sr
x
MnO
3
THIN LAYERS DEPOSITED IN LOW-PRESSURE RF PLASMA WAVE SHOCK REACTOR
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H
2
RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME
Vol. 7 '2003
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INVESTIGATION ON SUPERSONIC GAS FLOW COUPLED WITH AN INDUCTIVE LOW-PRESSURE PLASMA USED FOR THE SYNTHESIS OF SOFC MATERIAL
Vol. 8 '2004
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
HYDROGENATION AND PURIFICATION OF SILICON BY RF PLASMA
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL DIAGNOSTICS TO CONTROL ON LINE MELTING OF SILICON MATERIAL TREATED BY THERMAL PLASMA PROCESS. NEW IMPROVEMENTS FACED WITH SEVERE CONDITIONS.
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PASSIVATION OF POLYCRYSTALLINE SILICON BY HYDROGEN PLASMA : CHARACTERIZATION BY IMPEDANCE SPECTROSCOPY
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
DIAGNOSTIC OF FLOW FIELDS OF SILICON PARTICLES IN AN RF PLASMA FOR PURIFICATION TREATMENTS
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
EXPERIMENTAL INVESTIGATION OF IMPURITY EVAPORATION FROM POWDERS INJECTED IN AN RF PLASMA TORCH
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
MODELLING OF THE RF MULTIFLUX PLASMATRON
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
OFF-LINE STUDIES OF PLASMA SURFACE INTERACTIONS BETWEEN A RF PLASMA JET AND 3W/0 BORON DOPED GRAPHITE
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
CALCULATION OF TEMPERATURE AND FLOW IN RF PLASMATORCH - INFLUENCE OF COLD CHANNEL PRODUCED BY AXIAL GAS INJECTION
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
IN-FLIGHT MEASUREMENT OF PARTICLE SIZE AND VELOCITY IN A RADIO FREQUENCY PLASMA TORCH
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
PLASMA PROCESS FOR THE VITRIFICATION OF INCINERATION FLYASH
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
PROPERTIES AND CHARACTERISATION OF PHOTOVOLTAIC SILICON LAYERS OBTAINED BY RF THERMAL PLASMA SPRAYING PROCESS
Vol. 1 '1999
-
Progress in Plasma Processing of Materials, 1999
INVESTIGATION OF DUSTED JET OF RF PLASMA TORCH
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
PHYSICO-CHEMICAL CONDITIONS STUDY FOR DEPOSITION OF SILICON LAYER ON A SUBSTRATE BY RF PLASMA
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
STUDY OF VARIOUS PARAMETERS INFLUENCING THE TREATMENT OF SILICON PARTICLES IN A R.F. PLASMA FLOW
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
Use of a Plasma Torch as an Ablation Test Mean - Study of the Ablation Behavior of two Graphitic Materials: C + NbC, C + TaC
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
CALCULATION OF SILICON PARTICLES DYNAMICS, HEAT AND MASS TRANSFERS IN THERMAL PLASMAS. EFFECT OF PARTICLES VAPORIZATION
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
EFFECTS OF PLASMA PARAMETERS ON THE PROPERTIES OF La
1-x
Sr
x
MnO
3
THIN LAYERS DEPOSITED IN LOW-PRESSURE RF PLASMA WAVE SHOCK REACTOR
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
PLASMA REFINING OF METALLURGICAL SILICON: THERMODYNAMIC AND CHEMICAL ASPECTS
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT.
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
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