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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimer: 1093-3611
ISSN En ligne: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief: Valiantsin M. Astashynski

Associate Editor: Nikolai N. Cherenda

Objectifs et champs d'application

High Temperature Material Processes is an important international publication devoted to original and invited review papers on fundamental and applied re-search and new developments in materials processing and synthesis at high temperatures, especially under the plasma action as well as the treatment by laser, ion and electron beams. Processes of interest include (but not limited to) surface treatments, alloying, coatings production, nanostructures synthesis, welding, cutting, melting, re-melting and purification of metals, metallurgy (among them plasma metallurgy), powder densification, ultra-fine powder production, waste conversion and destruction. In addition, attention is paid to the development, description and study of experimental and industrial systems and devices for the implementation of high-technology plasma and beam processes. Thus, there is a broad range of coverage of experimental, analytical and numerical studies. High Temperature Material Processes will serve the needs of those who develop high temperature processes to produce materials with improved properties, surface treatments or coatings with given specifications, and will also promote connections between laboratories and industry.

La plupart des articles téléchargés

MEASUREMENT OF THE MAGNETIC FIELD DISTRIBUTION IN A MAGNETICALLY INSULATED DIODE WITH EXTERNAL MAGNETIC FIELD
Wan-Ying Huang, Jie Shen, Hao-Wen Zhong, Jie Zhang, Guo-Ying Liang, Xiang Yu, Shi-Jian Zhang, Mo-Fei Xu, Jian-Wei Gao, Xiao Yu, Sha Yan, Xiao-Yun Le

COMPUTATIONAL PROBLEMS OF THERMAL RADIATION IN AEROSPACE ENGINEERING
Anouar Soufiani, Sophia Haussener, Leonid A. Dombrovsky

ADVANCED THERMAL PLASMA MODELLING
Anthony B. Murphy, Maher I. Boulos, Vittorio Colombo, Pierre Fauchais, Emanuele Ghedini, Alain Gleizes, D. C. Schram, Pierre Proulx

CHARACTERISTIC FEATURES OF HEATING SEMICONDUCTOR SILICON STRUCTURES DURING RAPID THERMAL TREATMENT IN THE VLSI TECHNOLOGY
Vitalii A. Bondariev, Valentina Gorushko, Vladimir Pilipenko, Vitaly Solodukha

STRUCTURAL FEATURES OF THE FORMATION OF MULTICOMPONENT AND HIGH-ENTROPY TRANSITION METAL NITRIDE FILMS
Alexander Pogrebnjak, Alexander Goncharov, Andrey Yunda, Igor Shelest, Antoni Swic, Ihor Lebedynskyi

FILM–SUBSTRATE SURFACE ALLOY FORMED BY AN INTENSE PULSED ELECTRON BEAM
Yurii F. Ivanov, Nikolay N. Koval, Olga V. Krysina, P. V. Moskvin, E. A. Petrikova, O. S. Tolkachev