Journal of Flow Visualization and Image Processing

ISSN for PRINT: 1065-3090

For Online Access

Best Paper Award Selection - Editorial Board Site

2000, Volume7

Issue 1

92 pages

Issue price - $140.00

C. Y. Soong
Rotating Fluids and Vortex Dynamics Lab, Department of Aeronautical Engineering, Chung Cheng Institute of Technology, Tahsi, Taoyuan, Taiwan 33509, ROC

R. Y. Tzong
Research and Development Department, EVEREST Technology Corporation, Hsinchu Industrial Park, Huko, Hsinchu, Taiwan 30300, ROC

The present work is concerned with the numerical visualization of flow patterns, temperature fields, and concentration contours in a low-pressure metal organic chemical vapor deposition (MOCVD) reactor with a rotating susceptor. For simulation of the variable-property gas flow, the dilute mixture approach is invoked, and the compression work and thermal diffusion effects are also included. By considering gas inlet pressures of 0.2, 0.1, and 0.05 atm at various rotating rates, the influences of the operating pressure on the flow fields and the epitaxial growth rate are examined. The central theme of the present work lies in visualizing the details of the flow fields at various operating conditions in order to diagnose the flow quality and attain profound physical insights into the mechanisms of macrotransport phenomena of large-area epitaxy in low-pressure MOCVD reactors.

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