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High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

An International Journal 

ISSN for PRINT: 1093-3611

Institutional price:

$604.00

Issues per year:

4

For Online Access

Best Paper Award Selection - Editorial Board Site

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2001, Volume5

Issue 2

  152 pages  

   

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Issue price - $144.00  

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  • MODEL FOR ELECTRONIC RELAXATION IN PLASMA JETS FOR MIXTURES AR-O2
  • A. Lebehot
    Laboratoire d'Aerothermique du CNRS 1C Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2, France

    V. Lago
    Laboratoire d'Aerothermique du CNRS 1C Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2, France

    M. Dudeck
    ICARE Inst.-CNRS and University of Paris 6, 75252 Paris, France

    J. Kurzyna
    Instytut Podstawowych Problemow Techniki - PAN, Swietokrzyska 21,00-149 Warszawa, Polska


    ABSTRACT

    A simple collisional-radiative model is applied to plasma jet expansions in the case of Ar-O2 mixtures in order to calculate the population densities of the electronic states of the neutral atomic species Ar and O. Are included in the calculation: the direct excitation and de-excitation of Ar and O by electron collisions, excitation transfers between heavy species (Ar-Ar, Ar-O, Аr-О2, O-O2 and O-O collisions), and spontaneous radiative decay of Ar and O atoms. The results are compared with the experimental data obtained by three different experiments.

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