High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) An International Journal

ISSN for PRINT: 1093-3611

For Online Access

Best Paper Award Selection - Editorial Board Site

2005, Volume9

Issue 3

156 pages

DOI: 10.1615/HighTempMatProc.v9.i3

Issue price - $144.00

M. Sorokin
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

G. M. W. Kroesen
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

W. W. Stoffels
Eindhoven University of Technology, Department of Applied Physics, P.O.Box 513, DenDolech 2, Eindhoven, the Netherlands

In this work we present an overview of our investigations on the particle formation in Silane plasma. We propose a generalized model, based on a simple balance equation, explaining the temperature and flow dependence of the agglomeration time of nano-clusters in Ar-SiH₄plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth.

DOI: 10.1615/HighTempMatProc.v9.i3.20 Download article, 345-352 pages

Article price - $35.00

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