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High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

An International Journal 

ISSN for PRINT: 1093-3611

Institutional price:

$604.00

Issues per year:

4

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Best Paper Award Selection - Editorial Board Site

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2007, Volume11

Issue 3

  164 pages  

DOI: 10.1615/HighTempMatProc.v11.i3   

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Issue price - $168.00  

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  • SHEATH CHARACTERISTICS OF AN EXCIPLEX XE-NE-HCL LAMP PUMPED BY PHOTO TRIGGERED DISCHARGE
  • S. Bendella
    Laboratory of Plasma physics, Materials conducting and their Applications Faculty of science. Department of Physics U.S.T.O.MB El M'NAOUERB.P 1505, Oran, ALGERIA

    A. Belasri
    Laboratory of Plasma physics, Materials conducting and their Applications Faculty of science. Department of Physics U.S.T.O.MB El M'NAOUERB.P 1505, Oran, ALGERIA


    ABSTRACT

    The role of the cathode layer in Xenon- Neon- HCl photo triggered discharge for exciplex lamps is studied in this work. We developed a one-dimensional model of the cathode sheath coupled to a kinetics model of plasma and with the external circuit. The one-dimensional model is based on the resolution of the equations of continuity with the Poisson's equation. In the kinetics model, the plasma is represented by a variable value of resistance in time. The electric and kinetic parameters of the discharge are discussed and analysed.

    DOI: 10.1615/HighTempMatProc.v11.i3.100

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