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High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

An International Journal

ISSN for PRINT: 1093-3611

Institutional price:	$604.00
Issues per year:	4

Best Paper Award Selection - Editorial Board Site

2004, Volume8

178 pages

DOI: 10.1615/HighTempMatProc.v8.i1

Issue price - $144.00

PLASMA PROCESSING OF CARBON NANOMATERIALS

L. Fulcheri
Center for Energy and Processes, Ecole des Mines de Paris, Rue Claude Daunesse B.P.. 207, F-06904 Sophia-Antipolis Cedex, France

T. M. Gruenberger
Ecole des Mines de Paris, B.P. 207, P-06904 Sophia Antipolis, France

J. Gonzales-Aguilar
Center for Energy and Processes, Ecole des Mines de Paris, Rue Claude Daunesse B.P.. 207, F-06904 Sophia-Antipolis Cedex, France

F. Fabry
Timcal Belgium S.A., Erachem Comilog S.A ; 534, Av. Louise, B-1050 Brussels, Belgium

E. Grivei
Timcal Belgium S.A., 534, av, Louise, B-1050 Brussels, Belgium

N. Probst
Timcal Belgium S.A., 534, av, Louise, B-1050 Brussels, Belgium

Gilles Flamant
Laboratoire Procédés Matériaux et Energie Solaire (CNRS-PROMES), 7 Rue du Four Solaire, Odeillo, 66120 Font-Romeu, France

H. Okuno
University of Louvain, Unit of Physico-Chemistry and Physics of Materials, LLN, Belgium

J.-C. Charlier
University of Louvain, Unit of Physico-Chemistry and Physics of Materials, LLN, Belgium

ABSTRACT

Thermal plasma processes show certain advantages over conventional gas phase synthesis process for the production of carbon nanomaterials. Due to the extreme temperature conditions and the unique flexibility, very different structures can be produced at high selectivity. An overview is given of the three principal families of nanostructures, carbon blacks, fullerenes and nanotubes, produced so far by the original three-phase AC plasma technology presented. Various examples of individual structural types are used to illustrate and explain the multitude of different particle formation processes adjustable in plasma systems. Numerical simulation of arc region, kinetics and fluid dynamics appears as a central tool for the control of the three main process parameters: temperature profile, particle residence time and species concentrations.