High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) An International Journal

ISSN for PRINT: 1093-3611

For Online Access

Best Paper Award Selection - Editorial Board Site

2005, Volume9

Issue 2

155 pages

DOI: 10.1615/HighTempMatProc.v9.i2

Issue price - $144.00

V. V. Azharonok
Institute of Molecular and Atomic Physics of the National Academy of Sciences of Belarus, F.Skaryna Av., 70, Minsk, 220072, Belarus

L. I. Filatova
Institute of Molecular and Atomic Physics of the National Academy of Sciences of Belarus, F.Skaryna Av., 70, Minsk, 220072, Belarus

V. D. Shimanovich
Institute of Molecular and Atomic Physics of NAS of Belarus, 70 Skaryna Av., 220072 Minsk, Belarus

The process of deposition of semitransparent fullerene contained composite films in a capacitively coupled rf discharge is investigated. The 5.28 MHz discharge is operated in a parallel plate reactor. As a working gas helium is used at pressure 0.5 ÷ 5 Torr. Carbon films are deposited on a quartz plate. Products of electric arc synthesis of fullerenes (a small-dispersed carbon soot containing fullerene C₆₀ and C₇₀) are used as an initial substance for making carbon films. The processes in the discharge are studied by emission spectroscopy methods. The gas kinetic temperature is measured in different zones of the discharge gap near the quartz substrate. Optical absorption properties and structure of obtained films are investigated using UV-VIS spectrophotometer and scanning electron microscope.

DOI: 10.1615/HighTempMatProc.v9.i2.80 Download article, 263-267 pages

Article price - $35.00

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