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High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)

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High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)
 

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ISSN: 1093-3611 Print

ISSN: 1940-4360 Online

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click 'Save as...' here to save XML metadata   Year 2003, Volume 7 / Issue 3

DOI: 10.1615/HighTempMatProc.v7.i3

Pages: 145

DOI: 10.1615/HighTempMatProc.v7.i3.70 Article price - $35.00 Add to shopping cart

THE INFLUENCE OF COPPER ON MICROSTRUCTURE AND CATALYTIC PROPERTIES OF CEO2 THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION


ABSTRACT

Thin films of cerium dioxide doped with Cu were elaborated by Pulsed Laser Deposition technique from sintered Cu-CeO2 targets. The films were deposited on (100) oriented Si substrates. Scanning and Transmission Electron Microscopy, as well as x-ray diffraction analyses showed correlation between a copper atom fractions and crystalline structure of (Cu, Ce)O2 thin films. As demonstrated by x-ray diffraction analysis, when the quantity of Cu increases, the (Cu,Ce)O2 thin films manufactured by laser ablation show a change of the crystal growth preferential orientation (c-axis-orientation) from strong <111> to a strong <200> ones. Infrared Spectrometry showed that, the change of the copper doped ceria crystals (Cu,Ce)O2 texture has a significant influence on their catalytic behaviour with CH4.


pages 333-342


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