High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) An International Journal

ISSN for PRINT: 1093-3611

For Online Access

Best Paper Award Selection - Editorial Board Site

2002, Volume6

Issue 4

125 pages

Issue price - $144.00

Joost J. A. M. van der Mullen
Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands

M J. van de Sande
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

Jeroen Jonkers
Philips Extreme Ultra Violet, Aachen, Germany

A. Sola
Departamento de Fisica Aplicada, Universidad de Cordoba, 14071 Cordoba, Spain

A. Gamero
Departamento de Fisica Aplicada, Universidad de Cordoba, 14071 Cordoba, Spain

Antonio Rodero
Departamento de Fisica, Universidad de Cordoba, E-14071 Cordoba, Spain

Thomson scattering was used to monitor the temporal behavior of the electron gas during the power interruption and power modulation of respectively an inductively coupled plasma (ICP) in argon and a capacitively coupled plasma (CCP) in He both operating under atmospheric conditions. In both cases we studied the electron gas during the decay and re-ignition phase. It is found that experimental results can only be understood if we accept that molecular ions play a dominant role during the plasma decay phase. This is remarkable since plasmas in noble gases are known as atomic plasmas. Interesting features are the anomalous heating of the electron gas during the decay of the Ar-ICP and the heating of the higher energy part of the electron energy distribution function (EEDF) in He-CCP. The EEDF of the He-CCP was found to be far from Maxwellian.

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