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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

Volume 23, 2019

Volume 22, 2018

Volume 21, 2017

Volume 20, 2016

Volume 19, 2015

Volume 18, 2014

Volume 17, 2013

Volume 16, 2012

Volume 15, 2011

Volume 14, 2010

Volume 13, 2009

Volume 12, 2008

Volume 11, 2007

Volume 10, 2006

Volume 9, 2005

Volume 8, 2004

Volume 7, 2003

Volume 6, 2002

Volume 5, 2001

Volume 4, 2000

Volume 3, 1999

Volume 2, 1998

Volume 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief: Valiantsin M. Astashynski

Associate Editor: Nikolai N. Cherenda

Aims and Scope

High Temperature Material Processes is an important international publication devoted to original and invited review papers on fundamental and applied re-search and new developments in materials processing and synthesis at high temperatures, especially under the plasma action as well as the treatment by laser, ion and electron beams. Processes of interest include (but not limited to) surface treatments, alloying, coatings production, nanostructures synthesis, welding, cutting, melting, re-melting and purification of metals, metallurgy (among them plasma metallurgy), powder densification, ultra-fine powder production, waste conversion and destruction. In addition, attention is paid to the development, description and study of experimental and industrial systems and devices for the implementation of high-technology plasma and beam processes. Thus, there is a broad range of coverage of experimental, analytical and numerical studies. High Temperature Material Processes will serve the needs of those who develop high temperature processes to produce materials with improved properties, surface treatments or coatings with given specifications, and will also promote connections between laboratories and industry.

Most Downloaded Articles

MEASUREMENT OF THE MAGNETIC FIELD DISTRIBUTION IN A MAGNETICALLY INSULATED DIODE WITH EXTERNAL MAGNETIC FIELD
Wan-Ying Huang, Jie Shen, Hao-Wen Zhong, Jie Zhang, Guo-Ying Liang, Xiang Yu, Shi-Jian Zhang, Mo-Fei Xu, Jian-Wei Gao, Xiao Yu, Sha Yan, Xiao-Yun Le

COMPUTATIONAL PROBLEMS OF THERMAL RADIATION IN AEROSPACE ENGINEERING
Anouar Soufiani, Sophia Haussener, Leonid A. Dombrovsky

ADVANCED THERMAL PLASMA MODELLING
Anthony B. Murphy, Maher I. Boulos, Vittorio Colombo, Pierre Fauchais, Emanuele Ghedini, Alain Gleizes, D. C. Schram, Pierre Proulx

HIGH-POWER DOUBLE-PULSE GENERATOR FOR POWER SUPPLY TO PULSED HIGH-CURRENT ACCELERATOR
G. E. Remnev, Mikhail V. Zhuravlev, M. V. Belyakov, I. A. Koryashov, I. N. Pyatkov, M. I. Kaikanov, A. V. Tikhonov

CHARACTERISTIC FEATURES OF HEATING SEMICONDUCTOR SILICON STRUCTURES DURING RAPID THERMAL TREATMENT IN THE VLSI TECHNOLOGY
Vitalii A. Bondariev, Valentina Gorushko, Vladimir Pilipenko, Vitaly Solodukha

PREPARATION AND CHARACTERIZATION OF A TUNGSTEN COATING LAYER ON CuCrZr ALLOY FOR THE PLASMA FACING COMPONENTS OF THE EAST
Muhammad Imran, Jielin Shi, Dongye Zhao, Qi Wang, Yong Wang, Cong Li, Ran Hai, Harse Sattar, Zhongxin Mu, Wan-Jing Wang, Guang-Nan Luo, Gennadii E. Remnev, Hongbin Ding