Autores, editores e revisores da Begell House

Vladimir M. Maslovsky

Department of Micro- and Nanoelectronics, Moscow Institute of Physics and Technology (State University), 9 Institutskii Lane, Dolgoprudnyi, Moscow Region, 141700 Russia

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Articles

HIGH-RATE HIGH-DENSITY ICP ETCHING OF GERMANIUM Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

INFLUENCE OF TEMPERATURE ON HIGH-FIELD INJECTION MODIFICATION OF MIS STRUCTURES WITH THERMAL SiO₂ FILMS DOPED WITH PHOSPHORUS Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

SIMULATION OF ANNEALING AND THE ELDRS IN p-MNOS RadFETs Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

INTRINSIC GETTERING IN SILICON SUBSTRATE OF MOS STRUCTURES UNDER COMBINED INFLUENCE OF RADIATION AND PULSED MAGNETIC FIELDS Vol. 24 '2020 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes