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Dimitrious E. Rapakoulias
Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece
Obtenha mais informações sobre o autor no Diretório de especialistas
Articles
IMPROVEMENTS IN CONTROL AND UNDERSTANDING OF RADIO FREQUENCY SILANE DISCHARGES
Vol. 1 '1997
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE
Vol. 11 '2007
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 15 '2011
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES
Vol. 3 '1999
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 4 '2000
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O
2
GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO
2
THIN FILMS
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PLASMA PARAMETERS DERIVED FROM ELECTRICAL MEASUREMENTS IN RF PARALLEL PLATE ARGON GLOW DISCHARGES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
SPECIFIC PROBLEMS OF ROTATIONAL TEMPERATURE DETERMINATION IN PLASMAS OF MOLECULAR GASES
Vol. 1 '1997
-
Progress in Plasma Processing of Materials, 1997
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
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