Autores, editores e revisores da Begell House

E. Amanatides

Plasma Technology Laboratory -Dept. of Chem. Engineering-University of Patras, P.O.Box 1407, 26500 Patra, Greece
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Articles

EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES Vol. 15 '2011 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SPATIAL DISTRIBUTION OF OPTICAL EMISSION IN SiH4/H2 RF DISCHARGES Vol. 3 '1999 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES Vol. 4 '2000 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003