Begell House Authors, Editors and Reviewers

C. Trassy

UPR 9033 CNRS - EPM, ENSHMG BP 95 - 38402 Saint-Martin-d'Heres - France
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Articles

COMPARISON OF AIR AND ARGON PLASMAS IN GASEOUS ELEMENTAL POLLUTANT ANALYSIS FOR PROCESS CONTROL AND ENVIRONMENT Vol. 1 '1997 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTINUOUS MONITORING OF METAL VOLATILISATION IN A PLASMA FURNACE BY INDUCTIVELY COUPLED PLASMA EMISSION SPECTROMETRY Vol. 1 '1997 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTROL OF THE EVAPORATION IN A PLASMA FURNACE FOR FERROSILICON DUST TREATMENT Vol. 1 '1997 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EXPERIMENTAL STUDY OF THE EFFECT OF REACTIVE GAS INJECTION GEOMETRY IN ATMOSPHERIC PRESSURE INDUCTIVE PLASMA TORCH ON THE CHEMICAL EFFICIENCY Vol. 13 '2009 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
NUMERICAL STUDY OF THE REACTIVE SPECIES Vol. 14 '2010 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: ROLE OF CALIBRATION AND SAMPLE GAS Vol. 5 '2001 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
MICROWAVE PECVD SYSTEM FOR SiNx:H ANTIREFLECTION COATINGS AND HYDROGEN PASSIVATION ON MULTICRYSTALLINE SILICON Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EXPERIMENTAL INVESTIGATION OF METAL PARTICLE VAPORIZATION IN PLASMA SPRAYING Vol. 1 '1997 - Progress in Plasma Processing of Materials, 1997
MACROSCOPIC TECHNIQUES FOR RF. PLASMA REACTOR DIAGNOSTICS Vol. 1 '1997 - Progress in Plasma Processing of Materials, 1997
ON LINE MONITORING OF ELEMENTAL POLLUTANTS IN FLUE GASES: STANDARDIZATION, PRECISION AND ACCURACY Vol. 1 '1997 - Progress in Plasma Processing of Materials, 1997
SIMULATION OF THE d3Πg-a3Πu SYSTEM (SWAN BAND) OF THE C2 MOLECULE IN ATMOSPHERIC PRESSURE ARGON ICP FOR DIAGNOSTIC OF DIAMOND DEPOSITION PROCESS Vol. 1 '1999 - Progress in Plasma Processing of Materials, 1999
TRUENESS AND PRECISION IN ON-LINE MONITORING OF METALLIC POLLUTANTS IN FLUE GASES BY ICP-OES Vol. 1 '1999 - Progress in Plasma Processing of Materials, 1999
CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
CONTROL OF INDUCTIVELY COUPLED PLASMA PROCESSES BY MODELLING OF THE OPTICAL SPECTROSCOPIC EMISSION Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
GAS TEMPERATURE IN CONTRACTED ATMOSPHERIC PRESSURE DISCHARGES SUSTAINED IN CYLINDRICAL TUBES BY MICROWAVES AT 2450 MHZ Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
ON-LINE CONTINUOUS MONITORING OF A PLASMA PURIFICATION PROCESS USING ANALYSIS OF METALS IN FLUE GASES BY ICP-OES Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
VALIDATION OF EXPERIMENTAL INVESTIGATION OF METAL PARTICLE VAPORISATION IN PLASMA SPRAYING BY ATOMIC SPECTROSCOPY: DETERMINATION OF DIFFUSION COEFFICIENTS Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
EFFECT OF ELECTRIC FIELD ON THE NON-EQUILIBRIUM IN AN INDUCTIVELY COUPLED PLASMA Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003
MICROWAVE PECVD SYSTEM FOR SiNx:H ANTIREFLECTION COATINGS AND HYDROGEN PASSIVATION ON MULTICRYSTALLINE SILICON Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003
PLASMA REFINING OF METALLURGICAL SILICON: THERMODYNAMIC AND CHEMICAL ASPECTS Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003