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S. Rousseau
Laboratoire de Génie des Procédés Plasmas et Traitement de Surface − Université Pierre et Marie Curie − Paris 6 - ENSCP, 11, rue Pierre et Marie Curie, 75231 Paris Cedex 05
Get more info about author from Directory of Specialists
Articles
RF PLASMA PROCESS FOR HIGH PURITY SILICON
Vol. 10 '2006
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF THE DC BIAS APPLIED TO A MG MOLTEN SILICON BATH ON ITS PURIFICATION BY RF THERMAL PLASMA
Vol. 13 '2009
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
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