Begell House Authors, Editors and Reviewers

Ch. Voulgaris

Plasma Technology Lab, Dept.Chem. Engineering, University of Pates, P.O.Box 1407,26500 Patra, Greece
Get more info about author from Directory of Specialists

Articles

TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes