Begell House作者，编辑及审稿者

E. S. Rogovsky

Department of Semiconductor Electronics and Semiconductor Physics, National University of Science and Technology "MISiS" (NUST "MISiS"), Moscow, 119049, Russia
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Articles

HIGH-RATE HIGH-DENSITY ICP ETCHING OF GERMANIUM Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes