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Begell House作者,编辑及审稿者
Begell House作者,编辑及审稿者
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作者
编辑
审稿人
E. Amanatides
Plasma Technology Laboratory -Dept. of Chem. Engineering-University of Patras, P.O.Box 1407, 26500 Patra, Greece
Get more info about author from Directory of Specialists
Articles
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 15 '2011
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SPATIAL DISTRIBUTION OF OPTICAL EMISSION IN SiH
4
/H
2
RF DISCHARGES
Vol. 3 '1999
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES
Vol. 4 '2000
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O
2
GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO
2
THIN FILMS
Vol. 9 '2005
-
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH
4
/H
2
DEPOSITION DISCHARGES OPERATING AT DIFFERENT
Vol. 0 '2001
-
Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES
Vol. 0 '2003
-
Progress in Plasma Processing of Materials, 2003
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