Autoren, Herausgeber und Rezensenten von Begell House

Dimitrious E. Rapakoulias

Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece

Articles

IMPROVEMENTS IN CONTROL AND UNDERSTANDING OF RADIO FREQUENCY SILANE DISCHARGES Vol. 1 '1997 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE Vol. 11 '2007 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SIH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES Vol. 15 '2011 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES Vol. 3 '1999 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT RADIO FREQUENCIES Vol. 4 '2000 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PLASMA PARAMETERS DERIVED FROM ELECTRICAL MEASUREMENTS IN RF PARALLEL PLATE ARGON GLOW DISCHARGES Vol. 1 '1997 - Progress in Plasma Processing of Materials, 1997
SPECIFIC PROBLEMS OF ROTATIONAL TEMPERATURE DETERMINATION IN PLASMAS OF MOLECULAR GASES Vol. 1 '1997 - Progress in Plasma Processing of Materials, 1997
EFFECT OF INTERELECTRODE SPACE ON PROPERTIES OF SiH4/H2 DEPOSITION DISCHARGES OPERATING AT DIFFERENT Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
PLASMA DIAGNOSTICS FOR THE INVESTIGATION OF SILANE BASED GLOW DISCHARGE DEPOSITION PROCESSES Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003