Progress in Plasma Processing of Materials, 1997

ISBN Print: 1-56700-093-2

UV OH BAND SPECTRUM FOR TEMPERATURE MEASUREMENTS OF NON-EQUILIBRIUM PLASMAS

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DOI: 10.1615/ITPPC-1996.250
pages 201-210

Stephane Pellerin GREMI, CNRS-Universite d'Orleans, BP 6759, 45067 Orleans Cedex 2, France LASEP, Universite d'Orleans - Antenne de Bourges, BP4043, 18028 Bourges, France

K. Musiol Marian Smoluchowski Inst. of Physics, Jagellonian University, ul. Reymonta 4,30-459 Krakow, Poland

J.-M. Cormier GREMI-ESPEO, CNRS-Universite d'Orleans, BP 6759, 45067 Orleans Cedex 2, France

F. Richard GREMI - Universite d'Orleans - BP 6759 - 45067 ORLEANS CEDEX 2

J. Chapelle LASEP, Centre Universitaire de Bourges, Rue Gaston Berger, BP 4043, 18028 Bourges Cedex, France

Abstrakt

Noisy and spectrally not well resolved molecular emission spectra of the 306.357nm OR band were employed for evaluation of the rotational temperature in different plasma sources, in the temperature range from 300K to 6000K, when an apparatus function of a recording system is unknown. The method, is based on a comparison of experimental data with a theoretical spectrum. Different weakly ionized plasma sources are examined. Temperatures, obtained from the OR spectra, are in good agreement with temperatures obtained by using others techniques. Thus, the OH spectra are very useful for temperature measurements of non-equilibrium plasmas.

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