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Progress in Plasma Processing of Materials, 2001

ISBN Druckformat: 1-56700-165-3

SIMULATION OF LOW-PRESSURE RF DISCHARGES IN PROCESSING OF SOLID SURFACES

Abstrakt

A mathematical model of the treatment of solid surfaces with a stream of the induction or capacitative or hybrid (both inductive and capacitative) coupled RF plasma at low pressure is discussed. The mathematical model describes the process of generating the plasma stream inside the plasma torch as well as the positive ion sheath near specimen. The spatial distributions of the concentration and the average temperature of electrons, the intensity of electric and magnetic fields, the gas pressure and speeds in the quasi-neutral plasma, the average energy of the ion bombardment of the surface and the ion current onto the surface from the layer of the positive charge near the surface were calculated.
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