Kundenlogin 0 Einkaufswagen
Home Bücher eBücher Zeitschriften Referenzen und Berichte Autoren, Herausgeber, Rezensenten A – Z Produktindex
Progress in Plasma Processing of Materials, 2001

ISBN Druckformat: 1-56700-165-3

VACUUM ARC DEPOSITED NANOSTRUCTURED Ti COATINGS

Abstrakt

Ti coatings on silicate glass substrates have been produced using a nonfiltered vacuum arc deposition technique. The dependence of the deposition rate on the distance from the cathode both in lateral and transversal directions was investigated. The average roughness, Ra, decreases with the distance, showing a transition area between the microparticle-containing and microparticle-free Ti films. A linear dependence of Ra on the discharge current was obtained only for substrates far enough from the cathode. For substrates close to the cathode the dependence is governed by the microparticle density. Transmission electron microscopy (???) reveals dense structure with nanograins.
Home Begell Digitales Portal Begell Digitale Bibliothek Zeitschriften Bücher eBücher Referenzen und Berichte Autoren, Herausgeber, Rezensenten A – Z Produktindex Preise und Aborichtlinien Über Begell House Kontakt Language English 中文 Русский 日本語 Português Deutsch Français Español