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Progress in Plasma Processing of Materials, 2001

ISBN Druckformat: 1-56700-165-3

DEPOSITION OF YTTRIA-STABILISED ZIRCONIA COATINGS USING LIQUID PRECURSORS

Abstrakt

Aqueous solutions containing ZrO(NO3)2·6H2O were injected into an inductively generated high-power plasma to produce zirconia coatings in a thermal plasma chemical vapour deposition (TPCVD) process. Coatings of monoclinic ZrO2 which adhered well to the substrate were obtained when ZrO(NO3)2·6H2O alone was present in the solvent with a concentration of 0.7 mol/1. When Y(NO3)3·6H2O was added such that the concentration ratio of Zr and Y salts was 6:1, the ZrO2 forming the coatings was stabilised in its cubic modification which was confirmed by X-ray diffractometry as well as EDX mapping.
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