Progress in Plasma Processing of Materials, 1997

ISBN Print: 1-56700-093-2

EXPERIMENTAL INVESTIGATION OF IMPURITY EVAPORATION FROM POWDERS INJECTED IN AN RF PLASMA TORCH

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DOI: 10.1615/ITPPC-1996.850
pages 713-720

Daniel Morvan Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

Jacques Amouroux Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

S. Magnaval Laboratoire de Génie des Precédés Plasmas, Université P.et M. Curie ENSCP, 11 rue P.et M. Curie, 75005 Paris - France

Sergey V. Dresvin Laboratory of Electrotechnological and Plasma Installation of Polytechnic Institute -SPb State Polytechnical University, 29 Polytechnicheskaya Str., 195251 Saint-Petersburg, Russia

Shi Nguen-Kuok Laboratory of Electrotechnological and Plasma Installation Polytechnical Institute - University of St-Petersburg, Russia

Abstract

An investigation study of the evaporation of Si particles (−2+0.1 mm) and Fe−Si particles (−400+100 μm) in an RF plasma torch has been done. The purity and morphology of the powders have been carried out by the use of different chemical analyses, such as XRD, FTIR, SEM and ICP. The chemical analyses before and after treatment show that the impurity segregations depend on the nature of the matrix.

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