Progress in Plasma Processing of Materials, 2001

ISBN Print: 1-56700-165-3

Transport of atomic radicals in expanding plasmas: a laser spectroscopy study

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DOI: 10.1615/ITPPC-2000.120
pages 83-88

S. Mazouffre Department of Applied Physics, Eindhoven Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.

R. A. H. Engeln Eindhoven University of Technology, Eindhoven, The Netherlands

M.G.H. Boogaarts Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.

Joost J. A. M. van der Mullen Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands

D. C. Schram Dept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands

Abstract

The transport mechanisms of radicals (H and D) and neutrals (Ar) in plasma expansions have been studied by means of laser-based diagnostic techniques: TALIF, LIF and UV Rayleigh scattering. The flow of radicals does not fulfill the well-established free-jet shock wave picture. H(D) atoms escape the supersonic domain of the plasma jet. This outward diffusion process is driven by the huge density gradients induced in the background by wall-recombination. For the first time it is clearly shown that processes at surfaces can strongly influence the radical flow pattern.

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