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Progress in Plasma Processing of Materials, 2001

ISBN Print: 1-56700-165-3

SYNTHESIS OF THIN FILMS WITH CONTROLLED ABSORPTION BY JET INDUCTIVE COUPLED RF PLASMA TORCH

Abstract

The thin-film coatings of SiOx and TiOx (0 < x < 2) with controlled absorption received by low pressure RF plasma are- investigated in the present work.
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