Progress in Plasma Processing of Materials, 2003
ISBN Print: 978-1-56700-192-1
ISBN Online: 978-1-56700-447-2
THEORETICAL AND EXPERIMENTAL INVESTIGATIONS OF MODIFICATION OF MATERIALS AT LOW PRESSURE RF PLASMAS
DOI: 10.1615/ITPPC-2002.480
pages 373-378
Abstract
Authors present a physical and mathematical model of low-pressure RF plasma processing of solid surfaces. It is showed that the ion energy Ei. and the ion current density ji. onto the solid surface, which are the major generalized parameters of RF plasma treatment of solids, are achieved to values Ei = 10 ÷ 100 eV, ji = 0.3 ÷ 25 A·m−2.
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