The author presents the results of studying the influence of the cathode sputtering on upper surface layer. The samples were cathode sputtered in nitrogen atmosphere with following ranges of parameters: voltage 700-1350 V, intensity 1-4 mA/cm2 and time 10-60 min. The upper surface obtained after cathode sputtering was examined using SEM and the roughness was measured. The structure of upper surface was determined on the grounds of the GID investigations for different incidence angles (2°, 5° and 9°). The results show that voltage and intensity are the most important parameters of cathode sputtering. The duration of cathode sputtering affected very poorly the changes in upper surface and had only an influence on the roughness of the surface.