Auteurs, éditeurs et examinateurs de Begell House

Pavel A. Shchur

Moscow Aviation Institute (National Research University), Volokolamskoe Shosse, 4, 125993, Moscow, Russia

Articles

NANOSTRUCTURING OF THE POLYETHYLENETEREPHTHALATE SURFACE USING ION-PLASMA TECHNOLOGY WITH THE HELP OF FLUORINE-CONTAINING GAS MIXTURES Vol. 24 '2020 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
FORMATION OF ANTIMICROBIAL CARBON AND FLUOROCARBON COATINGS USING PREDICTIVE MODELING OF THEIR PROPERTIES Vol. 25 '2021 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
STUDY OF THE SURFACE OF ANTIMICROBIAL BARRIER LAYERS BASED ON FLUOROCARBON AND CARBON FILMS Vol. 26 '2022 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ANTIADHESION FLUOROCARBON COATINGS WITH INDUCED SURFACE CHARGE FOR PROTECTION AGAINST BIODEGRADATION Vol. 27 '2023 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INFLUENCE OF ION-PLASMA TREATMENT OF ATMOSPHERIC PRESSURE ON THE CAPILLARITY OF REINFORCING FILLERS AND POLYMER COMPOSITE MATERIALS BASED ON THEM Vol. 27 '2023 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INVESTIGATION OF THE EFFECT OF NOZZLE TEMPERATURE ON THE PROPERTIES OF POLYETHYLENE SAMPLES OBTAINED BY FDM PRINTING Vol. 27 '2023 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SURFACE PROPERTIES OF FLUOROCARBON COATINGS PRODUCED BY LOW-FREQUENCY PLASMATRON AT ATMOSPHERIC PRESSURE Vol. 27 '2023 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
THE EFFECT OF THE FLUORINE CONCENTRATION IN A PLASMA-FORMING GAS MIXTURE ON THE CHEMICAL COMPOSITION, SURFACE CHARGE, AND RELIEF PARAMETERS OF FLUOROCARBON COATINGS ON PET Vol. 28 '2024 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes