Connexion utilisateur 0 Panier
Accueil Livres eBooks Revues spécialisées Références et comptes rendus Auteurs, éditeurs, examinateurs Index A-Z des produits
Progress in Plasma Processing of Materials, 2003

ISBN Imprimer: 978-1-56700-192-1

ISBN En ligne: 978-1-56700-447-2

PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT.

Résumé

Plasma deposition process of metallurgical grade silicon powders was used in order to combine purification and deposition processes onto different kinds of substrate with a high deposition rate (~ 100 µm.mn−1). The particles are heated, melted, partially vaporised and finally deposited on a substrate. Under optimised experimental conditions dense deposits are obtained on ceramic substrate with a thickness close to 1 mm. Except the final crystallised zone, EDX and ICP analysis show that the deposits have good purity. However, because of a fast crystallisation, several crystalline defects have been observed. Introduction of hydrogen was used in order to passive this defects and to increase the photovoltaic properties.
Accueil Portail numérique Begell Bibliothèque numérique Begell Revues spécialisées Livres eBooks Références et comptes rendus Auteurs, éditeurs, examinateurs Index A-Z des produits Prix et politiques d'abonnement A propos de Begell House Contactez-nous Language English 中文 Русский 日本語 Português Deutsch Français Español