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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimer: 1093-3611
ISSN En ligne: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief

Associate Editor

Comité de rédaction

Nikolay N. Koval Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia; National Research Tomsk State University, 36 Lenin Ave., Tomsk, 634050, Russia
Email: koval@hcei.tsc.ru
Oleg F. Petrov Joint Institute of High Temperatures RAS, Russian Academy of Science, Moscow, Russia
Email: ofpetrov@ihed.ras.ru
Alexander D. Pogrebnjak Department of Nanoelectronics, Sumy State University, 2 Rimsky-Korsakov Str., 40007 Sumy, Ukraine
Email: alexp@i.ua
Gennadii E. Remnev National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia
Email: remnev@hvd.tpu.ru
Vladimir V. Uglov Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia
Email: uglov@bsu.by
Pawel Zhukowski Lublin University of Technology, Poland
Email: pawel@elektron.pol.lublin.pl