Begell House - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief: Valiantsin M. Astashynski Andrey V. Gusarov

ISSN Imprimer: 1093-3611

ISSN En ligne: 1940-4360

Editor-in-Chief

Valiantsin M. Astashynski

A.V. Luikov Heat and Mass Transfer Institute, National Academy of Sciences of Belarus, 15 P. Brovka Str., Minsk, 220072, Belarus; National Research Nuclear University "MEPhI" (Moscow Engineering Physics Institute), 31 Kashirskoe Highway, Moscow, 115409, Russia

Editor-in-Chief

Andrey V. Gusarov

Laboratory of Innovative Additive Technologies, Moscow State University of Technology STANKIN, Moscow, Russia

Associate Editor

Nikolai N. Cherenda

Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; South Ural State University, 76 Lenin Ave., Chelyabinsk, 454080, Russia

Comité de rédaction

Philippe Bertrand Laboratoire de Tribologie et Dynamique des Systèmes, Ecole Nationale d'Ingénieurs de Saint Etienne, Ecole interne de l'Ecole Centrale de Lyon, 58 rue Jean Parrot, Saint Etienne 42023, France Email: philippe.bertrand@enise.ec-lyon.fr

Leonid Dombrovsky Joint Institute for High Temperatures Email: ldombr@yandex.ru

Alexey G. Gnedovets A.A. Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, 49 Leninsky Prospect, Moscow, 119334, Russia Email: agg@imet.ac.ru

Nikolay N. Koval Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia; National Research Tomsk State University, 36 Lenin Ave., Tomsk, 634050, Russia Email: koval@hcei.tsc.ru

Milorad M. Kuraica Faculty of Physics, University of Belgrade, Studentski trg 12, 11000 Belgrade, Serbia Email: kuki@ff.bg.ac.rs

Oleg F. Petrov Joint Institute of High Temperatures RAS, Russian Academy of Science, Moscow, Russia Email: ofpetrov@ihed.ras.ru

Alexander D. Pogrebnjak Department of Nanoelectronics, Sumy State University, 2 Rimsky-Korsakov Str., 40007 Sumy, Ukraine Email: alexp@i.ua

Gennadii E. Remnev National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia Email: remnev@hvd.tpu.ru

Marleen Rombouts Vlaamse Instelling voor Technologisch Onderzoek (VITO), Boeretang 200, Mol, 2400, Belgium Email: marleen.rombouts@vito.be

Vladimir V. Uglov Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia Email: uglov@bsu.by

Igor Yadroitsev Faculty of Engineering, Built Environment and Information Technology, Central University of Technology, Free State (CUT), Bloemfontein, South Africa Email: iyadroitsau@cut.ac.za

Pawel Zhukowski Faculty of Electrical Engineering and Computer Science, Department of Electronics, University of Technology, Lublin, Poland Email: pawel@elektron.pol.lublin.pl