Begell Houseの著者、編集者及びレビュー者

F. Krayem

ENSCP-UPMC Laboratory of plasma processing and surface treatment 11, rue Pierre et Marie Curie 75005 Paris - France
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Articles

Study of excited atomic states of hydrogen and chemical phenomena on liquid silicon target under a RF inductive thermal plasma torch Vol. 5 '2001 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
IN-FLIGHT MEASUREMENT OF PARTICLE SIZE AND VELOCITY IN A RADIO FREQUENCY PLASMA TORCH Vol. 1 '1999 - Progress in Plasma Processing of Materials, 1999
PROPERTIES AND CHARACTERISATION OF PHOTOVOLTAIC SILICON LAYERS OBTAINED BY RF THERMAL PLASMA SPRAYING PROCESS Vol. 1 '1999 - Progress in Plasma Processing of Materials, 1999
PHYSICO-CHEMICAL CONDITIONS STUDY FOR DEPOSITION OF SILICON LAYER ON A SUBSTRATE BY RF PLASMA Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
STUDY OF VARIOUS PARAMETERS INFLUENCING THE TREATMENT OF SILICON PARTICLES IN A R.F. PLASMA FLOW Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001