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Begell Houseの著者、編集者及びレビュー者

M. Benmansour

Laboratoire de Génie des Procédés Plasmas et Traitement de Surface − Université Pierre et Marie Curie − Paris 6 - ENSCP, 11, rue Pierre et Marie Curie, 75231 Paris Cedex 05

Articles

RF PLASMA PROCESS FOR HIGH PURITY SILICON Vol. 10 '2006 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF THE DC BIAS APPLIED TO A MG MOLTEN SILICON BATH ON ITS PURIFICATION BY RF THERMAL PLASMA Vol. 13 '2009 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H2 RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
HYDROGENATION AND PURIFICATION OF SILICON BY RF PLASMA Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL DIAGNOSTICS TO CONTROL ON LINE MELTING OF SILICON MATERIAL TREATED BY THERMAL PLASMA PROCESS. NEW IMPROVEMENTS FACED WITH SEVERE CONDITIONS. Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PHYSICO-CHEMICAL CONDITIONS STUDY FOR DEPOSITION OF SILICON LAYER ON A SUBSTRATE BY RF PLASMA Vol. 0 '2001 - Progress in Plasma Processing of Materials, 2001
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN ARGON-HYDROGEN RF INDUCTIVE THERMAL PLASMA TORCH Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003
PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT. Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003
SILICON MATERIAL THERMAL TREATMENT PROCESS. EVALUATION OF RESIDENCE TIME Vol. 0 '2003 - Progress in Plasma Processing of Materials, 2003