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Progress in Plasma Processing of Materials, 2001

ISBN:
1-56700-165-3 (印刷)

SYNTHESIS OF THIN FILMS WITH CONTROLLED ABSORPTION BY JET INDUCTIVE COUPLED RF PLASMA TORCH

I. A. Abdullin
Kazan State Technological University, Kazan, Russian Federation

R. T. Galiaoutdinov
Scientific and Research Institute of Pumping Engineering Technology apart. 20, house 42, Gavrilova str., Kazan 420137, Russia

Nail F. Kashapov
Kazan Federal University, 18 Kremlevskaya Str., Kazan, 420008, Russia

要約

The thin-film coatings of SiOx and TiOx (0 < x < 2) with controlled absorption received by low pressure RF plasma are- investigated in the present work.